FSI receives ORION® Single Wafer Cleaning System Order from Leading Global Semiconductor Foundry for 32/28nm FEOL Applications
MINNEAPOLIS (June 24, 2010) -- FSI International, Inc. (Nasdaq: FSII), a leading supplier of surface conditioning equipment for microelectronics manufacturing, announced today that it has received an order for its FSI ORION single wafer processing system from a second major semiconductor foundry in Asia.
FSI International, Inc. Announces Third Quarter and First Nine Months Fiscal 2010 Results
MINNEAPOLIS (June 24, 2010) -- FSI International, Inc. (Nasdaq: FSII), a leading manufacturer of capital equipment for the microelectronics industry, today reported financial results for the third quarter of fiscal 2010 and for the first nine months ended May 29, 2010.
FSI International Inc. to Announce Availability of Third Quarter Fiscal Year 2010 Results
MINNEAPOLIS (June 17, 2010) -- FSI International, Inc. (Nasdaq: FSII), a leading manufacturer of capital equipment for the microelectronics industry, will release its financial results for third quarter of fiscal 2010 on Thursday, June 24, 2010, after market close and will host a conference call later the same day at 4:30 pm. Eastern Time (3:30 p.m. Central Time) to discuss the results.
FSI is a global supplier of cleaning equipment and technology to the world’s leading integrated circuit (IC) and microelectronics manufacturers.
FSI offers a complete portfolio of proven single wafer and batch products for immersion, spray, vapor and cryokinetic cleaning applications, tailored to the unique requirements of its customers. Through close collaboration with customers, FSI enables IC manufacturers to drive down their overall cost of manufacturing and migrate to the next technology generation.
FSI supports customers worldwide through a global network of offices staffed by highly experienced, dedicated teams — all backed by the Chaska, Minnesota, USA headquarters’ staff and Class 1 development lab.
FSI offers a complete portfolio of proven single wafer and batch products for immersion, spray, vapor and cryokinetic cleaning applications.