| 1973 |
- FSI International, originally named Fluoroware
Systems Corporation, is founded in Chaska, Minnesota
- First centrifugal spin dryer (Model K–10)
manufactured for drying silicon wafers
- FSI joins Semiconductor Equipment and
Materials International (SEMI)
|
| 1974 |
|
| 1975 |
- Introduces 8200 series new line
of clean machines
- Co-founds Metron Semiconductor Europa,
international distributor of semiconductor equipment and
materials
|
| 1976 |
- Introduces 2120 series of acid spray
processors
|
| 1977 |
- Company changes name to FSI Corporation
|
| 1980 |
- Builds new 42,000 sq. ft. corporate headquarters
in Chaska
|
| 1982 |
- Introduces SATURN® Spray
Processor
- Introduces NEPTUNE® line
of rinser/dryers
|
| 1983 |
- Establishes FSI Japan for rinser/dryer
production
- Introduces TITAN® Spray
System
|
| 1984 |
- Introduces ATLAS® Developer
System
|
| 1985 |
- Acquires Semiconductor Technologies Inc.
- Breaks ground for expansion of corporate
headquarters in Chaska
- Introduces PHOENIX® rinser/dryer
- Obtains license agreement
to manufacture Convac equipment
- Enters chemical management market and
commercializes bulk chemical distribution
- Forms Metron Semiconductors Asia
|
| 1986 |
- Receives first Texas Instruments Supplier
Excellence Award
|
| 1987 |
- FSI Corporation changes name to FSI International
Inc.
- Receives second Texas Instruments Supplier
Excellence Award
- Introduces EXCALIBUR® EOS
Gas Processing System with vapor phase technology
|
| 1988 |
- Receives third Texas Instruments Supplier
Excellence Award
- SEMI/SEMATECH is formed and FSI becomes
a member
- Begins shipping MERCURY® Spray
Cleaning System
- Receives the R&D 100 Award for Vapor
Phase Technology
|
| 1989 |
- FSI becomes a publicly listed company
- Receives fourth Texas Instruments Supplier
Excellence Award
|
| 1990 |
- Licenses POLARIS® Microlithography
Cluster technology from Texas Instruments
|
| 1991 |
- Establishes m•FSI, joint venture
with Mitsui & Co., Ltd. and Chlorine Engineers Corp.,
Ltd.
- Ships first POLARIS® Microlithography
Cluster
|
| 1992 |
- Awarded SEMATECH "Partnering for
Total Quality" Award
- Opens microlithography operations in
Dallas, Texas
|
| 1993 |
- Receives first VLSI Research 10 BEST
Suppliers Award - Customer Satisfaction
|
| 1994 |
- Receives second VLSI Research 10 BEST
Suppliers Award
- Receives Editors' Choice Best Product
Awards from Semiconductor International for the EXCALIBUR®
ISR, MERCURY® MP and POLARIS® Microlithography
Cluster Systems
- First semiconductor equipment manufacturing
company to receive ISO 9001 certification
|
| 1995 |
- Two-for-one split of common stock
Receives fifth Texas Instruments Supplier Excellence Award
- Builds 115,000 sq. ft. manufacturing
headquarters for surface conditioning products in Chaska,
Minn.
- Licenses cryogenic aerosol cleaning technology
from IBM
- Acquires Applied Chemical Solutions
|
| 1996 |
- Receives third VLSI Research 10 BEST
Suppliers Award
- Receives sixth Texas Instruments Supplier
Excellence Award
- Introduces ARIES® Cryogenic
System
- ARIES® System receives Best New Product Award from
Semiconductor International
- Acquires Semiconductor Systems Inc.
- OrbiTrak® System receives Editor’s Choice Best
Product Award from Semiconductor International
|
| 1997 |
- Expands the surface conditioning headquarters,
adding 93,000 sq. ft. for engineering and state-of-the-art
laboratory
- Introduces ZETA® Spray
Cleaning System
- Builds 159,000 sq. ft. engineering, manufacturing
and laboratory facility in Allen, Texas for microlithography
products
|
| 1998 |
- Receives fourth VLSI Research 10 BEST
Suppliers Award
- Introduces ANTARES® Cryokinetic Cleaning
System
|
| 1999 |
- Receives fifth VLSI Research 10 BEST
Suppliers Award
- Introduces POLARIS® 3500 Microlithography
System
- Acquires YieldUP® International Corporation
- Divests Chemical Management Division
to BOC Edwards
- Introduces CALYPSO™ Spin-On
Dielectric System with Instacure™ Module
- Don Mitchell joins FSI as CEO and president
|
| 2000 |
- DIO3 Generation Module receives Editor's
Choice Best Product Award from Semiconductor International
- Introduces ZETA® FE
and BE Spray Cleaning Systems
- John Ely named president, Surface Conditioning
Division
|
| 2001 |
- Receives sixth VLSI Research 10 BEST
Suppliers Award
- Larry Wagner named president, Microlithography
Division
|
| 2002 |
- Joel Elftmann retires as chairman of
the board of directors
- Don Mitchell named chairman of the board
of directors
- Receives seventh Texas Instruments Supplier
Excellence Award
- Receives seventh VLSI Research 10 BEST
Suppliers Award
- Introduces MAGELLAN® Immersion
Cleaning System
- Metron Technology and FSI International
announce early termination of distribution agreement
- Ed Tang named president of asian business
- Stefano Avezzu named vice president
and general manager of European business
|
| 2003 |
- FSI achieves ISO 9001:2000 certification
- FSI receives ISO 14001 environmental
certification
- FSI stops new product development in
the microlithography market
- FSI introduces the POLARIS® Systems &
Services (PSS) organization and the POLARIS® Refresh Program™
- FSI introduces FlashClean™ Advantage package for the ZETA® system
- FSI introduces AspectClean™ CryoKinetic
process for the ANTARES® system
|
| 2004 |
- FSI introduces the Knowledges Services Seminar™ Series in Taiwan and China
- Receives eigth VLSI Research 10 BEST
Suppliers Award
|
| 2005 |
- FSI announces New PlatNiStrip™ Process for nickel platinum films
- Receives ninth VLSI Research 10 BEST
Suppliers Award
- FSI launches the EcoBlend™ Process Series of cost-effective dilute acid cleaning solutions
- ANTARES® System receives Editor's Choice Best Product Award from Semiconductor International
|
