Applications & Products

TEL FSI is focused on delivering semiconductor wafer cleaning products and solutions that enable IC manufacturers to meet their cost, yield and device performance goals. We work in close collaboration with our customers to develop and integrate customized cleaning solutions. TEL FSI has been a leading provider of advanced cleaning technologies for more than 35 years and is a trusted partner of leading semiconductor conductor manufacturers worldwide.

FEOL Critical Clean & Etch
Applications

This guide covers the key applications of advanced integrated circuit manufacturing and highlights the benefits TEL FSI products provide.

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Products

View our complete range of single wafer and batch platforms for immersion, spray, vapor and cryogenic cleaning technology applications.

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Products Wafer Size (mm) Applications
    FEOL Critical Clean & Etch FEOL All-Wet Resist Strip & Clean Silicide Metal Strip BEOL Strip & Clean Particle/Defect Removal Resist Processing
ORION
Single Wafer Cleaning System
300            
ANTARES
Single Wafer CryoKinetic System
200/
300
           
ZETA
Batch Spray System
200/
300
           
ZETA
Semi-Auto Batch Spray System
≤200            
MERCURY
Semi-Auto Batch Spray System
≤200