FSI Sponsors and Presents at the 2008 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces
FSI’s contributed presentations were held as follows:
Session 2: FEOL Cleaning
15:00 – 15:15 “Advances on 45nm SiGe-Compatible NiPt Salicide Process” Yi-Wei Chen, Nien-Ting Ho, Jerander Lai, T.C. Tsai, C.C. Huang, S.F. Tzou, United Microelectronics Corp., Taiwan James M.M. Chu, FSI, Taiwan.
Session 5: FEOL: POST I/I PR STRIP
11:15 – 11:30 “Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist” David DeKraker, Jeffery Butterbaugh, Kurt Christenson, Thomas Wagener, FSI International, USA
For more information on either of these presentations, click here.
