ZETA® System ViPR™ process strips highly implanted photoresist without plasma ashing
The high chemical reactivity achieved by the steam injected ViPR™ process allows it to strip photoresist by wet chemical action alone for all but the most extreme implant conditions. ViPR™, a sulfuric acid – hydrogen peroxide mixture, eliminates the need for ashing, reducing the stripping sequence from as many as three steps (clean, ash, clean) to one. The process is available on both auto and semi auto batch spray ZETA® systems for 150 or 200mm wafer processing. As an example , the time to clear blanket 2.5x1014 ions/cm2, 40keV Arsenic implanted photoresist dropped from 50 minutes in an immersion system to 5.5 minutes. That improvement in in process time dramatically reduces manufacturing cycle time especially when you consider the number of resist strip steps. Additionally, ZETA® systems typically fit into the space occupied by one ashing system and as a result free up a tremendous amount of space in an existing fab or space and capital in a new fab.
BENEFITS
- All wet removal of highly implanted photoresist
- Reduce material loss - dopant, Si, SiO2
- Reduce manufacturing cycle time
- Eliminate ashers and ashing process
- Increase fab floor space utilization
FEATURES
- Strip up to 5x1015 ions/cm2, 40keV Arsenic implants
- On wafer chemical mixing and steam injection increase chemical reactivity
- Automated or semi automated systems
- 150mm or 200mm wafer sizes
- Rapid wafer size conversion (Semi Auto)
ViPR™ process uses heat of vaporization carried by steam to increase reactivity by increasing temperature without excessive dilution
Fab space savings possible with ViPR™ process implementation
Implanted resist is still present on the left wafer after 20’ typical SPM process. Right wafer is completely cleared after 5.5 minutes in ViPR™ process.
Even in an existing fab, adopting ZETA® systems with ViPR™ can free up space for device expansion, reduce operations overhead, maintenance and spare parts support
For a more detailed review of ViPR™ resist stripping and other applications of the ViPR™ process, contact your local FSI account manager or e-mail FSI at This e-mail address is being protected from spambots. You need JavaScript enabled to view it .
