OTS (September 2008) -- The Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) objective is to increase the level of understanding on ultra-clean processing technology in all steps of IC-production.
The conference, which was held September 21-24 in Bruges, Belgium, included invited presentations as well as selected contributing presentations and posters.
FSI’s contributed presentations were held as follows:
Session 2: FEOL Cleaning
15:00 – 15:15 “Advances on 45nm SiGe-Compatible NiPt Salicide Process” Yi-Wei Chen, Nien-Ting Ho, Jerander Lai, T.C. Tsai, C.C. Huang, S.F. Tzou, United Microelectronics Corp., Taiwan James M.M. Chu, FSI, Taiwan.
Session 5: FEOL: POST I/I PR STRIP
11:15 – 11:30 “Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist” David DeKraker, Jeffery Butterbaugh, Kurt Christenson, Thomas Wagener, FSI International, USA
For more information on either of these presentations, click here.
