The ZETA® system with ViPR™ technology offers the highest performance and lowest cost solutions for resist, silicide and general film stripping needs. ZETA delivers significant improvements across a wide spectrum of front-end wet processing applications particularly in resist stripping and silicide integration.
ZETA® 300 Batch ZETA® 200 Batch
Benefits
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- Eliminates ashers
- Highest selectivity silicide strip process
- Lowest residual metal contamination
- Enables low temperature annealing for nickel platinum silicide formation
- High productivity and low material loss
- Reduced cycle time (eliminates 2-step ash/wet-strip process)
