Annual Reports
Quarterly Reports
FY 2012 Q3 10Q (05/26/12)
FY 2012 Q2 10Q (02/25/12)
FY 2012 Q1 10Q (11/26/11)
FY 2011 Q3 10Q (05/28/11)
Find the Right Solution
| Products | Wafer Size (mm) | Applications | |||||
| FEOL Critical Clean & Etch | FEOL All-Wet Resist Strip & Clean | Silicide Metal Strip | BEOL Strip & Clean | Particle/Defect Removal | Resist Processing | ||
|---|---|---|---|---|---|---|---|
|
ORION™ Single Wafer Cleaning System |
300 | ||||||
|
ANTARES™ Single Wafer Cryokinetic System |
200/ 300 |
||||||
|
ZETA™ Batch Spray System |
200/ 300 |
||||||
|
ZETA™ Semi-Auto Batch Spray System |
≤200 | ||||||
|
MERCURY™ Semi-Auto Batch Spray System |
≤200 | ||||||
Applications |
Products |
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