Contact Us   |   Suppliers   |   Employees   |   System Upgrades     Find the right solution! >>

Find the Right Solution

Products Wafer Size (mm) Applications
    FEOL Critical Clean & Etch FEOL All-Wet Resist Strip & Clean Silicide Metal Strip BEOL Strip & Clean Particle/Defect Removal Resist Processing
ORION™
Single Wafer Cleaning System
300            
ANTARES™
Single Wafer Cryokinetic System
200/
300
           
ZETA™
Batch Spray System
200/
300
           
ZETA™
Semi-Auto Batch Spray System
≤200            
MERCURY™
Semi-Auto Batch Spray System
≤200            
Applications and Products

  • Home
  • Applications & Products
  • Technical Publications
  • News & Events
  • Company
  • Investors
  • Customer Support
Applications
  • FEOL Critical Clean & Etch
  • FEOL All-Wet Resist Strip and Clean
  • Silicide Metal Strip
  • BEOL Strip & Clean
  • Particle/Defect Removal
  • Resist Processing
Products
  • ORION™
    Single Wafer Cleaning System
  • ANTARES™
    Single Wafer CryoKinetic System
  • ZETA™
    Batch Spray System
  • ZETA™
    Semi-Auto Batch Spray System
  • MERCURY™
    Semi-Auto Batch Spray System
  • POLARIS™
    Refresh Program™
  • System Upgrades
  • Other TEL FSI Products

 

Investors

  • Annual Reports
  • SEC Filings
  • XBRL Data
  • Stocks
  • Governance
  • Investors FAQ
  • Investor Contacts
  • News

Request More Information

Governance

Governance

Management and Directors

Governance Guidelines

Governance Charter

Audit and Finance Committee Charter

Compensation Committee Charter

Code of Ethics

 
Contact Us  |  Careers  |  Terms of Use  |  Site Map  |  Copyright © 2013. TEL FSI, Inc. All Rights Reserved