Hsinchu Agenda and Venue

Hsinchu, 13 November 2008

Seminar Location:

Lakeshore Hotel
Apollo II Room
No. 51, Lane 775, Ming-Hu Road
Hsinchu City 30065, Taiwan R.O.C.
Telephone: 886-3-5203181
http://www.lakeshore.com.tw/en/index.htm

Seminar Preliminary Agenda (subject to change):

8:30 to 9:00

Registration

9:00 to 9:10

Welcome and Introduction

9:10 to 11:30

Short Course “Cleaning Chemistry Compatibility with New IC Device Materials” - Professor Srini Raghavan (including coffee break)

11:30 to 12:00

Keynote Address “Flash Memory Technology – Current Status and Future Trend” – Dr. Yi-Chou Chen, Macronix

12:00 to 13:30

Lunch

13:30 to 13:50

FSI Corporate Overview and Product Introduction

13:50 to 14:30

FSI ORION® Single Wafer Cleaning System

14:30 to 15:00

ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist

15:00 to 15:20

Coffee Break

15:20 to 15:40

Advances on 45nm SiGe-Compatible NiPt Salicide Process

15:40 to 16:00

Challenges and Solutions for HKMG Cleaning

16:00 to 16:20

ANTARES® System Cryogenic Aerosol for Chemical-Free Particle Removal

16:20

Adjourn

 

Registration