Seoul Agenda and Venue
Seoul, 6 November 2008
Seminar Location:
The Ritz-Carlson, Seoul
602 Yoeksam-dong, Gangnam-ku
Seoul, Korea 135-080
Telephone: 62-3451-8000
http://www.ritzcarltonseoul.com
Seminar Preliminary Agenda (subject to change):
|
8:30 to 9:00 |
Registration |
|
9:00 to 9:10 |
Welcome and Introduction |
|
9:10 to 11:30 |
Short Course “Cleaning Chemistry Compatibility with New IC Device Materials” - Professor Srini Raghavan (including coffee break) |
|
11:30 to 12:00 |
Keynote Address “Advanced Surface Preparation for Ge-CMOS Integration” – Dr. Sangwoo Lim, Yonsei University |
|
12:00 to 13:30 |
Lunch |
|
13:30 to 13:50 |
Prevention of Condensation Defects on Contact Patterns by Improving Rinse Process – Jungmin Oh, Samsung |
|
13:50 to 14:10 |
FSI Corporate Overview and Product Introduction |
|
14:10 to 14:50 |
FSI ORION® Single Wafer Cleaning System |
|
14:50 to 15:10 |
Coffee Break |
|
15:10 to 15:40 |
ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist |
|
15:40 to 16:00 |
One step ashing and post cleaning performance of Zeta 200 machine – Jonghyuk Oh, Magnachip |
|
16:00 to 16:20 |
A Method for Improving the Wet Etching Stability of SOD – Gyuhyun Kim, Hynix |
|
16:20 to 16:40 |
ANTARES® System Cryogenic Aerosol for Chemical-Free Particle Removal |
|
16:40 |
Adjourn |