Shanghai, 4 November 2008
Seminar Location:
Parkyard Hotel Shanghai
699 Bibo Road
Zhangjiang Hi-Tech Park
Shanghai 201203, China
Telephone: 86-21-61621168
http://www.parkyard.com/en/index.aspx
Seminar Preliminary Agenda (subject to change):
|
8:30 to 9:00 |
Registration |
|
9:00 to 9:10 |
Welcome and Introduction |
|
9:10 to 11:30 |
Short Course “Cleaning Chemistry Compatibility with New IC Device Materials” - Professor Srini Raghavan (including coffee break) |
|
11:30 to 12:00 |
Keynote Address (invited speaker) |
|
12:00 to 13:30 |
Lunch |
|
13:30 to 13:50 |
FSI Corporate Overview and Product Introduction |
|
13:50 to 14:30 |
FSI ORION® Single Wafer Cleaning System |
|
14:30 to 15:00 |
ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist |
|
15:00 to 15:20 |
Coffee Break |
|
15:20 to 15:40 |
Advances on 45nm SiGe-Compatible NiPt Salicide Process – Yi-Wei Chen, UMC |
|
15:40 to 16:00 |
Challenges and Solutions for HKMG Cleaning |
|
16:00 to 16:20 |
ANTARES® System Cryogenic Aerosol for Chemical-Free Particle Removal |
|
16:20 |
Adjourn |