Taichung, 14 November 2008
Seminar Location:
Windsor Hotel
No. 78-3, Sec. 3 Taichung Kang Road
Taichung 40764, Taiwan R.O.C.
Telephone: 886 4 24656555
http://www.windsortaiwan.com/
Seminar Preliminary Agenda (subject to change):
|
9:30 to 10:00 |
Registration |
|
10:00 to 10:10 |
Welcome and Introduction |
|
10:00 to 12:00 |
Short Course “Cleaning Chemistry Compatibility with New IC Device Materials” - Professor Srini Raghavan |
|
12:00 to 13:30 |
Lunch |
|
13:30 to 14:00 |
Keynote Address “Flash Memory Technology – Current Status and Future Trend” – Dr. Yi-Chou Chen, Macronix |
|
14:00 to 14:20 |
FSI Corporate Overview and Product Introduction |
|
14:20 to 15:00 |
FSI ORION® Single Wafer Cleaning System |
|
15:00 to 15:20 |
Coffee Break |
|
15:20 to 15:40 |
ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist |
|
15:40 to 16:00 |
A Method for Improving the Wet Etching Stability of SOD |
|
16:00 to 16:20 |
Selective Co Stripping for Salicide Formation |
|
16:20 to 16:40 |
ANTARES® System Cryogenic Aerosol for Chemical-Free Particle Removal |
|
16:40 |
Adjourn |