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		FEOL Critical Clean & Etch
Products	Wafer Size (mm)	Applications
ORION® Single Wafer Cleaning System	300
ANTARES® Single Wafer Cryokinetic System	200/ 300
ZETA® Batch Spray System	200/ 300
ZETA® Semi-Auto Batch Spray System	≤200
MERCURY® Semi-Auto Batch Spray System	≤200
MAGELLAN® Batch Immersion System	200/ 300
POLARIS® Micro Lithography Cluster	N/A

Applications

Products

News & Events

2012 2011 2010 2009 2008

FSI International Receives Follow-on Orders for its ANTARES® Systems from a Leading Global Device Manufacturer Wednesday, 18 January 2012

MINNEAPOLIS (January 18, 2012) -- FSI International, Inc. (Nasdaq: FSII), a leading manufacturer of surface conditioning equipment for microelectronics manufacturing, announced today that a leading global device producer has placed follow-on orders for its ANTARES® CryoKinetic Cleaning System. The chip provider currently uses the ANTARES® System for various particle removal processes and with these orders, is adding capacity for advanced technology generations. The systems are expected to ship in fiscal 2012.*

FSI International Receives Orders for Multiple ANTARES® Systems from Leading Device Manufacturer Wednesday, 04 January 2012

MINNEAPOLIS (January 4, 2012) -- FSI International, Inc. (Nasdaq: FSII), a leading manufacturer of surface conditioning equipment for microelectronics manufacturing, announced today that a leading device producer has placed orders for multiple ANTARES® CryoKinetic Cleaning Systems, further broadening the platform’s installed base. The chip provider currently uses the ANTARES® System for various particle removal processes and with this order, is adding capacity for advanced technology generations. The systems are expected to ship during fiscal 2012.*