Order represents acceptance of new single wafer cleaning technology for 32nm applications
MINNEAPOLIS (December 23, 2008) — FSI International, Inc. (Nasdaq: FSII) a leading supplier of wafer processing, cleaning and surface conditioning equipment for semiconductor manufacturing, announced today the receipt of an order for its new ORION® single wafer cleaning platform from a major semiconductor manufacturer.
MINNEAPOLIS (Dec. 23, 2008) -- FSI International, Inc. (Nasdaq: FSII), a manufacturer of capital equipment for the microelectronics industry, today reported financial results for its fiscal 2009 first quarter ended November 29, 2008.
MINNEAPOLIS (December 16, 2008) -- FSI International, Inc. (Nasdaq: FSII), a manufacturer of capital equipment for the microelectronics industry, will release its financial information for first quarter fiscal 2009 results on Tuesday, December 23, 2008,
ViPR™ technology eliminates ashing for highly implanted photoresist and improves yields for metal stripping following salicide processes
MINNEAPOLIS (December 9, 2008) — FSI International, Inc. (Nasdaq: FSII), a leading supplier of surface conditioning equipment for microelectronics manufacturing, announced today that its FSI ZETA® spray cleaning system with ViPR™ technology is now available for 200mm wafer processing, and an Asian customer has qualified this technology for their 200mm manufacturing.
The FSI Asia Knowledge Services™ Seminar Series was held in Shanghai, Seoul, Singapore, Hsinchu and Taichung during the weeks of November 3 and 10, 2008. Over 450 customers participated in this highly rated seminar series.
Below is a list of presentation topics. To request a CD of the FSI Asia Knowledge Services™ Seminar presentations, click here.
FSI experiences continued growth in broadband wireless and wireline communications market
MINNEAPOLIS (November 19, 2008) — FSI International, Inc. (Nasdaq: FSII) a leading supplier of surface conditioning and microlithography equipment for microelectronics manufacturing, announced today that it has received a repeat order for a POLARIS® Microlithography System from a leading gallium arsenide (GaAs) device foundry.