Since the 2004 launch of FSI’s Knowledge Services™ Seminar Series, over 1000 IC manufactures worldwide have participated in these very informative day-long seminars, and FSI is pleased to bring added value to the supplier-customer relationship.
|
As stated by Don Mitchell, FSI chairman and CEO, “To address supplier-customer relationships for the era of “scaling by innovation”, we believe partnering strategy with IC makers is one of the most effective means for developing new products and processes to help customers address their manufacturing goals. Because of FSI’s long and rich history of partnering programs, customers are increasingly looking to us to help find solutions for emerging challenges. We work with customers to apply R&D programs to the real world of manufacturing -- resulting in unique technology advancements that benefit both customers and the industry.” |
Based on customer feedback from the recently held US series, held in Texas, New York, California and Oregon, attendees continue to find these sessions and the opportunity they offer to network with peers and FSI technologists, interesting and useful.
Dr. Anthony Muscat, associate professor of Chemical and Environmental Engineering, University of Arizona, did a great job of providing attendees with a morning short course on the "Fundamentals of Surface Characterization" and then immediately applying the principles through case studies. If you are interested in more information on this short course, please contact Dr. Anthony Muscat at This e-mail address is being protected from spambots. You need JavaScript enabled to view it
David Smith, vice president, Technology Futures, Inc., provided an intriguing keynote speech titled “The Future as Seen through Technology Laws — and It’s Not Just Technology Anymore.” He talked about the changing world and the convergence of driving factors: changing modes of communication, globalization, R&D, to name a few. If you are interested in more information on this topic, please contact David Smith at This e-mail address is being protected from spambots. You need JavaScript enabled to view it .
To round out the seminar, FSI and semiconductor manufacturing technologists presented discussions of surface preparation productivity and performance strategies for 65nm and beyond:
- Challenges and Solutions in Surface Preparation
- Cryogenic Aerosol for Zero-Damage Cleaning After Gate Electrode Formation
- Damage-Free Cryogenic Aerosol Clean Processes
- Precision Etching with Chemical Inject
- Achieving Ultra-Low Defectivity in Immersion Processing
- Metal Stripping for Co, Ni, and Ni-Pt Salicide Formation
- Ash-Free, Wet Stripping of Heavily Implanted Photoresist
To view more information on the FSI Knowledge Services™ Seminar Series, click here.