FSI is a Proud Sponsor of the MRS Spring Meeting “Symposium C – CMOS Gate-Stack Scaling-Materials, Interfaces and Reliability Implications”
Date: April 13-16, 2009
Place: Moscone West and San Francisco Marriott, San Francisco, CA
Find the Right Solution
| Products | Wafer Size (mm) | Applications | |||||
| FEOL Critical Clean & Etch | FEOL All-Wet Resist Strip & Clean | Silicide Metal Strip | BEOL Strip & Clean | Particle/Defect Removal | Resist Processing | ||
|---|---|---|---|---|---|---|---|
| ORION® Single Wafer Cleaning System |
300 | ||||||
| ANTARES® Single Wafer Cryokinetic System |
200/ 300 |
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| ZETA® Batch Spray System |
200/ 300 |
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| ZETA® Semi-Auto Batch Spray System |
≤200 | ||||||
| MERCURY® Semi-Auto Batch Spray System |
≤200 | ||||||
| MAGELLAN® Batch Immersion System |
200/ 300 |
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| POLARIS® Micro Lithography Cluster |
N/A | ||||||
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