The FSI Asia Knowledge Services™ Seminar Series was held in Shanghai, Seoul, Singapore, Hsinchu and Taichung during the weeks of November 3 and 10, 2008. Over 450 customers participated in this highly rated seminar series.
Below is a list of presentation topics. To request a CD of the FSI Asia Knowledge Services™ Seminar presentations, click here.
Short Course
- “Cleaning Chemistry Compatibility with New IC Device Materials” – taught by Dr. Srini Raghavan, Professor of Materials Science and Engineering, Univeristy of Arizona
ANTATRES® Single Wafer CryoKinetic Cleaning System
- “ANTARES® System Cryogenic Aerosol for Chemical-Free Particle Removal”
ORION® Single Wafer Cleaning Cluster
- “FSI ORION® Single Wafer Cleaning System ”
- “Challenges and Solutions for HKMG Cleaning”
- “ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist”
ZETA® Batch Spray Cleaning System
- “A Method for Improving the Wet Etching Stability of SOD” – Gyuhyun Kim, Hynix
- “Advances on 45nm SiGe-Compatible NiPt Salicide Process” – Yi-Wei Chen, UMC
- “Challenges and Solutions for HKMG Cleaning”
- “One step ashing and post cleaning performance of Zeta 200 machine” – Jonghyuk Oh, Magnachip
- “Selective Metal Stripping for Salicide Formation”
- “ViPR™ Steam-Injected SPM Process for All-Wet Stripping of Implanted Photoresist”
Other Topics
- “FSI Corporate Overview and Product Introduction”
- “Advanced Surface Preparation for Ge-CMOS Integration” – Dr. Sangwoo Lim, Yonsei University
- “Drivers for Low Material Loss PR Stripping and Cleaning"
- “Flash Memory Technology – Current Status and Future Trend” – Dr. Yi-Chou Chen, Macronix
- “Microelectronic Technology Overview for Societal and Environment Challenges” - Dr. Teng Gao, IMEC
- “Prevention of Condensation Defects on Contact Patterns by Improving Rinse Process" – Jungmin Oh, Samsung