Returning again to Asia in 2008

• 4 November in Shanghai
• 6 November in Seoul
• 11 November in Singapore
• 13 November in Hsinchu
• 14 November in Taichung

The FSI Knowledge Services™ Seminar Series brings practical knowledge to you, while creating an opportunity for interaction and discussion. Presentations from FSI and IC manufacturers address industry trends and implementation of surface preparation technology in IC manufacturing.

The 2008 Agenda

• Our popular Short Course which is focused on Cleaning Chemistries for New Materials taught by Dr. Srini Raghavan, Professor of Materials Science and Engineering, University of Arizona. Click here for Dr. Raghavan’s biography.
• An overview on FSI’s New Single Wafer Cleaning Cluster
• Technical Presentations by FSI and IC Manufacturers on Industry Drivers, Challenges and Solutions
  • All Wet Photoresist Removal
  • Metal Stripping for Salicide Formation
  • Particle Removal with Cryogenic Aerosol
  • High-k / Metal Gate Cleaning
  • Cleaning of Cu/Low-k Dual Damascene

The day also includes opportunities during breaks and lunch to network with your peers and other IC makers. And of course, a few "Lucky Draws" held throughout the day. To REGISTER NOW, click here.