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These sessions are FREE to all attendees!


TEL AVIV, ISRAEL : 13 MAY 2008

 

8:00 to 8:30

Morning Registration and Refreshments

8:30 to 8:40

Welcome/Introduction - FSI International

Session I
Short Course

8:40 to 10:40

Short Course: Cleaning Chemistry Compatibility with New IC Device Materials taught by Professor Srini Raghavan, Professor of Materials Science and Engineering, University of Arizona

 

10:40 to 11:00

Refreshment Break

Session II
Technical Seminar
Surface Conditioning Industry Drivers, Challenges and Solutions


11:00 to 11:20

FSI Corporate and Product Overview - FSI International
 

11:20 to 12:05

Trends and Cleaning Challenges in Non-Volatile Memory Technology - Numonyx
 

12:05 to 12:30

Steam-Injected SPM for High Performance Ash-Free All Wet Photoresist Stripping - FSI Inernational

Evaluation of the ZETA® System ViPR™ Process for All-Wet PR Strip in 200mm Manufacturing - Tower Semiconductor

12:30 to 13:50

Lunch and Afternoon Registration
 

13:50 - 14:00

Evolution of Salicide - FSI International

 

14:00 - 14:20

Optimization of SPM-SC1 Based Cobalt Salicide Selective Etching - Numonyx

 

14:20 - 14:40

FSI Single Wafer Cleaning System Overview - FSI International

 

14:40 - 15:10

Cu/low-k Challenges and Cleaning Process Development for 32nm/22nm Logic Technology - FSI International

 

15:10 - 15:30

Cryogenic Aerosol Processes for Yield Enhancement - FSI International

 

15:30 - 15:50

Refreshment Break

 

15:50 - 16:10

Influence of dry ashing and wet treatments on NVM metal gate structures - Numonyx

 

16:10 - 16:30

Yield Improvement Using the MAGELLAN System Flexibility to Achieve Recipe Optimization - Numonyx

 

16:30 - 16:50

ZETA® System for In-House Wafer Reclaim - FSI International

 

16:50

Adjourn

 
 

 

Seminar Registration

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Event Information

(Please check each event you will attend)

Will Attend:

Session, Time and Description:

8:00 to 11:00
Session I of FSI's Knowledge Services™ Seminar Series
Short Course: Cleaning Chemistry Compatibility with New IC Device Materials
Taught by Dr. Srini Raghavan, Professor of Materials Science and Engineering, University of Arizona

11:00 to 16:30
Session II of FSI's Knowledge Services™ Seminar Series
Surface Conditioning Industry Drivers, Challenges and Solutions,
FSI and invited presentations

Seminar Location

Bruno in the Azrieli Center

Azrieli Center, The Round Tower, 10th Floor, Tel Aviv

 

To view the venue, click here.

Ample parking is available at this location.

Hotel Accomodations

Dan Panorama Tel Aviv Hotel
Charles Clore Park, Tel Aviv

 

To view the hotel, click here.

 

Please contact the hotel directly if you need to reserve a hotel room.

 

Other Information

Special needs (Diet/Medical/Other):

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Conference Materials

All conference attendees will receive a binder of conference materials at the seminar.

If you have additional questions, please contact Mary Olson at:
mary.olson@fsi-intl.com.