FSI International (ticker: FSII, exchange: NASDAQ) News Release - 3/12/08
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FSI International’s 2008 Knowledge Services™ Seminar Series Offers Attendees Insight Into Surface Preparation Drivers and Processes for Advanced Technology Generations

Seminar Series in Europe and Israel includes short course and technical seminar on surface conditioning industry challenges and solutions

MINNEAPOLIS (March 12, 2008) -- FSI International, Inc. (Nasdaq: FSII) announces today the return of its successful Knowledge Services™ Seminar Series in Tel Aviv, Dresden, Grenoble, and adds Milan to the May 2008 series schedule. The full-day seminars will focus on surface conditioning challenges and solutions, and will feature technical presentations from FSI, major semiconductor manufacturers and research facilities, including ST Microelectronics, Intel, Qimonda and CEA/Leti. Dr. Srini Raghavan, professor of Materials Science and Engineering, University of Arizona, will present a short course on “Cleaning Chemistry Compatibility with New IC Device Materials.”

“Dr. Raghavan is a well-known expert in the field of applied surface chemistry,” said Don Mitchell, FSI chairman and CEO. “Dr. Raghavan has lectured on a variety of cleaning topics at FSI’s Knowledge Services Seminars around the world, and we are pleased that he is able to participate again this year.” He added, “Our customers find the Knowledge Services Seminar Series to be of great value—they can collaborate with other industry veterans and learn about specific technology challenges and cleaning solutions. By combining Dr. Raghavan’s short course with customer presentations, the seminars deliver well-rounded coverage of both the theoretical and practical aspects of today’s most advanced manufacturing processes.”

Since its introduction in 2004, FSI’s free Knowledge Services Seminars have attracted more than 1,500 IC manufacturing engineers and managers across Asia, Europe, Israel and the United States. The short course is presented in the morning, followed by a technical session. The technical session topics will include: cleaning challenges for phase change memory, cleaning challenges for DRAM, drivers for low silicon loss during cleaning, ashless photoresist stripping, salicide formation, single wafer cleaning technology, Cu/Low-k post etch/ash cleaning, cryogenic aerosol, batch immersion, wafer reclaim, among other important subjects.

The FSI Knowledge Services Seminar Series 2008 schedule for the Europe Middle East Area (EMEA) includes:

• Tel Aviv, Israel: 13 May 2008
• Milan, Italy: 15 May 2008
• Grenoble, France: 20 May 2008
• Dresden, Germany: 22 May 2008

To register for the program, or for additional information on specific locations and agendas, please visit the FSI Web site at www.fsi-intl.com/kssemea08.

FSI International, Inc. is a global supplier of surface conditioning equipment technology and support services for microelectronics manufacturing. Using the Company’s broad portfolio of cleaning products, which include batch and single wafer platforms for immersion, spray and CryoKinetic technologies, customers are able to achieve their process performance, flexibility and productivity goals. The Company’s support services programs provide product and process enhancements to extend the life of installed FSI equipment, enabling worldwide customers to realize a higher return on their capital investment. FSI maintains a web site at http://www.fsi-intl.com.

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